Anisotropic textured silicon obtained by stain-etching at low etching rates

  1. González-Díaz, B.
  2. Guerrero-Lemus, R.
  3. Marrero, N.
  4. Hernández-Rodríguez, C.
  5. Ben-Hander, F.A.
  6. Martiánez-Duart, J.M.
Journal:
Journal of Physics D: Applied Physics

ISSN: 1361-6463,  0022-3727

Year of publication: 2006

Volume: 39

Issue: 4

Pages: 631-634

Type: Article

DOI: 10.1088/0022-3727/39/4/006 GOOGLE SCHOLAR
Data source: Scopus