Anisotropic textured silicon obtained by stain-etching at low etching rates

  1. González-Díaz, B.
  2. Guerrero-Lemus, R.
  3. Marrero, N.
  4. Hernández-Rodríguez, C.
  5. Ben-Hander, F.A.
  6. Martiánez-Duart, J.M.
Aldizkaria:
Journal of Physics D: Applied Physics

ISSN: 1361-6463 0022-3727

Argitalpen urtea: 2006

Alea: 39

Zenbakia: 4

Orrialdeak: 631-634

Mota: Artikulua

DOI: 10.1088/0022-3727/39/4/006 GOOGLE SCHOLAR