Influence of the epitaxial composition on N-face GaN KOH etch kinetics determined by ICP-OES
- Tautz, M.
- Kuchenbrod, M.T.
- Hertkorn, J.
- Weinberger, R.
- Welzel, M.
- Pfitzner, A.
- Díaz, D.D.
Aldizkaria:
Beilstein Journal of Nanotechnology
ISSN: 2190-4286
Argitalpen urtea: 2020
Alea: 11
Orrialdeak: 41-50
Mota: Artikulua