Particle cleaning technologies to meet advanced semiconductor device process requirements

  1. Okorn-Schmidt, H.F.
  2. Holsteyns, F.
  3. Lippert, A.
  4. Mui, D.
  5. Kawaguchi, M.
  6. Lechner, C.
  7. Frommhold, P.E.
  8. Nowak, T.
  9. Reuter, F.
  10. Piqué, M.B.
  11. Cairós, C.
  12. Mettind, R.
Journal:
ECS Journal of Solid State Science and Technology

ISSN: 2162-8769,  2162-8777

Year of publication: 2014

Volume: 3

Issue: 1

Type: Article

DOI: 10.1149/2.011401JSS GOOGLE SCHOLAR
Data source: Scopus