Anisotropy and Mechanistic Elucidation of Wet-Chemical Gallium Nitride Etching at the Atomic Level

  1. Tautz, M.
  2. Weimar, A.
  3. Graßl, C.
  4. Welzel, M.
  5. Díaz Díaz, D.
Revue:
Physica Status Solidi (A) Applications and Materials Science

ISSN: 1862-6319 1862-6300

Année de publication: 2020

Volumen: 217

Número: 21

Type: Article

DOI: 10.1002/PSSA.202000221 GOOGLE SCHOLAR lock_openAccès ouvert editor

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