Surface Morphology Evolution of Chemical Vapor-Deposited Tungsten Films on Si(100)

  1. Vázquez, L. 1
  2. Salvarezza, R.C. 2
  3. Albano, E. 2
  4. Arvia, A.J. 2
  5. Hernández Creus, A. 3
  6. Levy, R.A. 4
  7. Albella, J.M. 1
  1. 1 Instituto de Ciencia de Materiales de Madrid
    info

    Instituto de Ciencia de Materiales de Madrid

    Madrid, España

    GRID grid.452504.2

  2. 2 Inst. Invest. Fisicoquimicas T., Sucursal 4
  3. 3 Universidad de La Laguna
    info

    Universidad de La Laguna

    San Cristobal de La Laguna, España

    GRID grid.10041.34

  4. 4 New Jersey Institute of Technology, University Heights
Journal:
Chemical Vapor Deposition

ISSN: 0948-1907

Year of publication: 1998

Volume: 4

Issue: 3

Pages: 89-91

Type: Article

Export: RIS
DOI: 10.1002/(SICI)1521-3862(199805)04:03<89::AID-CVDE89>3.0.CO;2-9 SCOPUS: 2-s2.0-0032072677 GOOGLE SCHOLAR
Data source: Scopus